Near-field optical recording and chemical force microscopy of photochemistry on organosilane self-assembled Monolayers

Kwang-Joo Kwak^a, Hiroshi Muramatsu^b, and Masamichi Fujihira^a

a) Department of Biomolecular Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8501, Japan
b) Corporate R&D, Seiko Instruments Inc., 563 Takatsuka-shinden, Matsudo-shi, Chiba 270-2222, Japan

Attachment and removal of organic molecules to silicon surfaces are of interest for a number of future technologies. The photochemical reaction of organosilane self-assembled monolayers (SAMs) was studied by using ultraviolet (UV) spectroscopy and atomic force microscopy (AFM). The SAM was formed on a fused silica slide or silicon (100) wafer by solution phase silanization with an aromatic organosilane. Photochemically modified monolayer was made by irradiation of a Nd-YAG laser operating at 266 nm. We present here a concept of near-field optical recording and chemical force microscopy of photochemistry on the SAM, i.e. atomic force microscopic reading of the photochemically sensitive surface.