Nanofabrication using scanning probe microscopy

Masayoshi Ishibashi, Seiji Heike, Midori Kato, and Tomihiro Hashizume

Hitachi, Ltd., Advanced Research Laboratory
HATAYAMA, SAITAMA 350-0395, JAPAN

We have developed scanning probe nanofabrication system based on atomic force microscopy (AFM). Our scanning probe nanofabrication system controls the exposure dose by using a constant-current feedback system. This feedback system significantly reduces variations in the width of the line patterns more than the common constant-bias feedback system. We developed the scanning probe nanofabrication system with the multiplayer resist method and the use of the spaces in the negative-type resist patterns to obtained high aspect-ratio pattern. .Patterns of 340 nm thick with a linewidth of 50 nm were fabricated using the multiplayer resist method, and 15-nm-wide space patterns in a 50-nm-thick resist film were fabricated using the spaces in the resist patterns. In this conference, we also report on a hybrid method of SPL and photolithography that increases the drawing speed and decreases the drawing length.