DNA Selective Adsorption on Aminosilane Patterned by Microcontact Printing

M. Fujita^a,b, W. Mizutani^c , M.Gad^d, H.Tokumoto^c, H. Shigekawa^b,e,f

a) National Institute of Advanced Industrial Science and Technology (AIST)
b) University of Tsukuba
c) Joint Research Center for Atom Technology (JRCAT)-AIST
d) JRCAT-Angstrom Technology Partnership
e) CREST
f) University ofTokyo

Self-assembled monolayers (SAMs) were patterned by microcontact printing (ｵCP) method [Xia and Whitesides, Polym. Mater. Sci. Eng. 77 (1997) 596] and used to adsorb and pattern DNA on them. Most of the ｵCP work used thiols on gold substrates, while there have been relatively few reports applying the technique to silane-oxide (insulator) system, which will be more practical in combining with semiconductor devices. Although reactive silane SAMs should be more investigated, the carboxyl acid group is reactive to the silanes themselves. Thus we used aminosilanes for selective reaction and adsorption process. The 10 ｵm patterns made by photolithography were transferred to the polymer stamp, and then aminosilane molecules were microcontact-printed on mica substrates. We applied DNA buffer solution on the patterned SAM, washed with pure water, and dried with nitrogen gas. The tapping mode force microscopy showed that the DNA molecules were deposited selectively on the patterned aminosilane film.